Suwon, South Korea

Seungwoo Jang

This inventor holds 9 USPTO granted patents and 11 published patent applications. Top assignees: Samsung Electronics Co., Ltd., Samsung Sdi Co., Inc.. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seungwoo Jang. Retrieved from https://idiyas.com/inventor/seungwoo-jang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9 

% Patents Active = 88.9

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021-2026

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9 patents (USPTO):Explore Patents

Title: Seungwoo Jang - Innovator in Photoresist Compositions

Introduction

Seungwoo Jang is an inventor based in Yongin si, South Korea. He has made significant contributions to the field of integrated circuit manufacturing through his innovative approaches to photoresist compositions. Although he currently holds no granted patents, his work is noteworthy for its potential impact on the industry.

Latest Patent Applications

Seungwoo Jang's latest patent application is titled "PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME." This application describes a photoresist composition that includes an organometallic compound featuring at least one metal-ligand bond, which consists of a metal core and at least one organic ligand. The composition also includes a first organic ligand precursor that differs in chemical structure from the organic ligand of the organometallic compound, incorporating a phosphonic acid group. The method outlined for manufacturing integrated circuit devices involves forming a photoresist film on a substrate and creating a modified organometallic compound through ligand exchange based on chemical equilibrium.

Conclusion

Seungwoo Jang's innovative work in photoresist compositions showcases his potential to influence the field of integrated circuit manufacturing. His contributions, although not yet reflected in granted patents, highlight the importance of ongoing research and development in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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