Daejeon, South Korea

Seung-Beom Cho

This inventor holds 20 USPTO granted patents and 3 published patent applications and 12 EPO patents, primarily in Chemical Mechanical Polishing. Top assignee: Lg Chem, Ltd. Active years: 2006-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung-Beom Cho. Retrieved from https://idiyas.com/inventor/seung-beom-cho-w3hyp36j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 90.0

 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Taejeon, KR (2006)
  • Daejeon, KR (2006 - 2015)

Company Filing History:


Years Active: 2006-2015

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Areas of Expertise:
CMP Slurry
Cerium Oxide
Chemical Mechanical Polishing
Slurry Composition
Abrasive Materials
Cerium Carbonate
Crystalline Powders
Metal Wiring
Zinc Sulfide
Alumina Nano Powder
Preparation Methods
20 patents (USPTO):Explore Patents

Title: Innovations by Inventor Seung-Beom Cho in Chemical Mechanical Polishing

Introduction: Seung-Beom Cho, an accomplished inventor based in Daejeon, South Korea, is known for his significant contributions to the field of chemical mechanical polishing (CMP). With a total of 20 patents to his name, Cho has captivated the industry with his inventive solutions aimed at improving polishing techniques and materials for semiconductor manufacturing.

Latest Patents: Among his latest contributions, Cho has developed a revolutionary slurry for chemical mechanical polishing. This innovative composition comprises an abrasive, an oxidant, an organic acid, and a polymeric additive that features a polyolefin-polyalkyleneoxide copolymer. The copolymer consists of both polyolefin and multiple polyalkyleneoxide repeat units, which significantly enhance the polishing efficiency. Another noteworthy patent by Cho pertains to a CMP slurry designed to minimize dishing generation during the polishing or planarization of silicon oxide layers. This polishing composition includes a polishing abrasive, a linear anionic polymer, and a compound containing a phosphoric acid group, achieving a remarkable polishing speed ratio of 30:1 to 50:1 between silicon oxide and silicon nitride layers.

Career Highlights: Seung-Beom Cho has made a name for himself at LG Chem, Ltd., where he continues to innovate and refine chemical polishing processes essential for semiconductor production. His role not only emphasizes his technical skills but also underscores his commitment to advancing technology in the materials science domain.

Collaborations: Throughout his career, Cho has collaborated with esteemed colleagues, including Myoung-hwan Oh and Jong-Pil Kim. Their teamwork has facilitated the advancement of CMP technologies and solidified their place in the competitive landscape of the semiconductor industry.

Conclusion: Seung-Beom Cho's dedication to innovation in chemical mechanical polishing is evidenced by his impressive list of patents and collaborative efforts. His latest inventions are poised to make a significant impact on the semiconductor manufacturing industry, enhancing the efficiency and effectiveness of polishing processes. As technology continues to evolve, Cho's contributions will undoubtedly pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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