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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8969204 B1

PDFFull Text
Date of Patent:
Mar. 03, 2015

Filed:

Mar. 03, 2009

Cmp slurry and a polishing method using the same

Applicants:

Jong-pil Kim, Daejeon, KR;

Seung-beom Cho, Daejeon, KR;

Jun-seok Noh, Daejeon, KR;

Jang-yul Kim, Daejeon, KR;

Inventors:

Jong-Pil Kim, Daejeon, KR;

Seung-Beom Cho, Daejeon, KR;

Jun-Seok Noh, Daejeon, KR;

Jang-Yul Kim, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:

Rothwell, Figg, Ernst & Manbeck, P.C.

Primary Examiner:

Nadine Norton

Assistant Examiner:

Stephanie Duclair

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); H01L 21/3105 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31053 (2013.01); C09G 1/02 (2013.01); C09K 3/1463 (2013.01); H01L 21/76229 (2013.01);
Abstract

The present invention relates to a CMP slurry that is able to reduce dishing generation, when it is applied to polishing or planarization of silicon oxide layer, for example, and a polishing method. The CMP slurry includes a polishing abrasive, a linear anionic polymer, a compound including a phosphoric acid group, and water, and the ratio of CMP polishing speed to a silicon oxide layer: CMP polishing speed to a silicon nitride layer is 30:1 to 50:1.

Find Patent Forward Citations

Kim, Jong-Pil. (2015). Cmp slurry and a polishing method using the same (U.S. Patent No. 8969204). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8969204

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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