Serguei Komarov

Title: The Innovative Contributions of Serguei Komarov

Introduction

Serguei Komarov is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of plasma etching processes, holding a total of 3 patents. His work focuses on enhancing the efficiency and accuracy of endpoint detection in etching processes.

Latest Patents

One of his latest patents is titled "Method of endpoint detection of plasma etching process using multivariate analysis." This patent describes a method for determining the endpoint of an etch process using optical emission spectroscopy (OES) data as an input. The OES data are acquired by a spectrometer attached to a plasma etch processing tool. The time-evolving spectral data are first filtered and demeaned, and then transformed into trends using multivariate analysis, such as principal components analysis. This method allows for a more precise determination of the endpoint of an etch process by incorporating multiple trends. Additionally, it discloses a method for calculating principal component weights prior to actual etching, based on OES data collected from previous etch processing. This facilitates rapid calculation of trends and functional forms for efficient and accurate in-line determination of the etch process endpoint.

Career Highlights

Serguei has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in plasma etching technologies.

Collaborations

Throughout his career, Serguei has collaborated with talented individuals such as Yan Chen and Vi Vuong. These collaborations have likely enriched his work and led to innovative advancements in his field.

Conclusion

Serguei Komarov's contributions to the field of plasma etching are noteworthy, particularly his innovative methods for endpoint detection. His patents reflect a deep understanding of multivariate analysis and its application in enhancing etching processes.