The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Jul. 22, 2010
Jason Ferns, Cupertino, CA (US);
John J. Hench, San Jose, CA (US);
Serguei Komarov, Sunnyvale, CA (US);
Thaddeus Dziura, San Jose, CA (US);
Jason Ferns, Cupertino, CA (US);
John J. Hench, San Jose, CA (US);
Serguei Komarov, Sunnyvale, CA (US);
Thaddeus Dziura, San Jose, CA (US);
Tokyo Electron Limited, Tokyo, JP;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.