Hwaseong-si, South Korea

Seok Heo

USPTO Granted Patents = 15 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Incheon, KR (2010 - 2017)
  • Hwaseong-si, KR (2018 - 2024)
  • Suwon-si, KR (2024)

Company Filing History:


Years Active: 2010-2025

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15 patents (USPTO):Explore Patents

Title: The Innovations of Seok Heo: A Pioneer in Substrate Processing Technology

Introduction

Seok Heo, an influential inventor based in Hwaseong-si, Korea, has made significant contributions to the field of semiconductor technology. With a portfolio of 11 patents, Heo continues to push the boundaries of innovation with his groundbreaking work in substrate processing apparatus and methods.

Latest Patents

Among Heo's most notable inventions is a substrate processing apparatus designed to optimize the fabrication of semiconductor devices. This apparatus features a photoresist coater that applies a photoresist film on a substrate. A key innovation is the inclusion of a humidifier that increases the amount of moisture in the environment surrounding the photoresist film, enhancing its exposure to light during the subsequent irradiation process.

Another remarkable patent is his substrate processing apparatus that supports and rotates a substrate during cleaning. It employs both first and second lower cleaning nozzles to spray different cleaning liquids on the substrate. Additionally, it features a bowl assembly that encapsulates the substrate, including a discharge guide plate and a movable discharge separation plate, which facilitate effective cleaning processes.

Career Highlights

Seok Heo has held significant roles in leading companies, including Samsung Electronics Co., Ltd. and the Seoul National University R&D Foundation. His work in these institutions has allowed him to harness cutting-edge technologies and contribute to advancements in semiconductor processing.

Collaborations

Throughout his career, Heo has collaborated with notable colleagues, including Yong Won Choi and Sungyong Park. These partnerships have fostered a dynamic exchange of ideas, greatly influencing the evolution of their innovative projects.

Conclusion

Seok Heo's dedication to innovation in substrate processing technology stands as a testament to his expertise and vision. With a solid patent portfolio and collaborations that propel advancement, he remains an essential figure in the ongoing development of semiconductor technologies. His contributions will undoubtedly continue to benefit the industry and inspire future inventors.

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