Tokyo, Japan

Senji Wada

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2011-2018

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5 patents (USPTO):Explore Patents

Title: Senji Wada: A Pioneer in Thin Film Technology

Introduction

Senji Wada is an innovative inventor based in Tokyo, Japan, recognized for his contributions to thin film technology. With a total of five patents to his name, Wada has made significant strides in the field of chemical vapor deposition and related materials.

Latest Patents

Among Senji Wada's latest patents, two notable inventions stand out. The first is an alkoxide compound specifically designed for thin film formation. This compound is represented by a unique formula (I) where R symbolizes a linear or branched alkyl group comprising 2 to 4 carbon atoms. Additionally, R and R' are indicated as linear or branched alkyl groups ranging from 1 to 4 carbon atoms, with ethyl being a preferred choice.

Wada's second significant patent revolves around the production of a β-ketoimine ligand and its corresponding metal complex. This innovation details methods for synthesizing the β-ketoimine ligand, characterized by R1 and R2, each independently classified as a C1-C5 alkyl group. The patent covers methods that employ this metal complex for forming thin films, showcasing Wada's commitment to advancing material science.

Career Highlights

Throughout his distinguished career, Senji Wada has held positions at reputable companies, including Adeka Corporation and Samsung Electronics Co., Ltd. His work in these organizations has been pivotal in developing advanced materials and processes that push the boundaries of technology.

Collaborations

Wada's collaborative efforts have also included working alongside esteemed colleagues such as Atsushi Sakurai and Masako Shimizu. These partnerships have fostered a rich exchange of ideas, contributing to innovative solutions in the realm of thin film technology.

Conclusion

Senji Wada's inventive spirit and dedication to research continue to impact the field of material science positively. As an inventor with multiple patents, his work in thin film technology demonstrates the significance of innovation in advancing industrial applications.

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