The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
May. 15, 2012
Applicants:
Senji Wada, Tokyo, JP;
Akio Saito, Tokyo, JP;
Tomoharu Yoshino, Tokyo, JP;
Inventors:
Assignee:
ADEKA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/04 (2006.01); C23C 16/06 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C07C 215/08 (2006.01);
U.S. Cl.
CPC ...
C07F 15/045 (2013.01); C07C 215/08 (2013.01); C23C 16/06 (2013.01); C23C 16/406 (2013.01); C23C 16/45553 (2013.01);
Abstract
An alkoxide compound represented by the following formula (I), and a raw material for thin film formation containing the alkoxide compound. In the formula, Rrepresents a linear or branched alkyl group having 2 to 4 carbon atoms, and Rand Reach represent a linear or branched alkyl group having 1 to 4 carbon atoms. In the formula (I), Ris preferably an ethyl group. It is also preferred that one or both of Rand Rbe an ethyl group. The raw material for thin film formation including an alkoxide compound represented by general formula (I) is preferably used as a raw material for chemical vapor deposition.