Sagamihara, Japan

Seishi Fujiwara

This inventor holds 23 USPTO granted patents, primarily in Silica Glass Manufacturing. Top assignee: Nikon Corporation. Active years: 1997-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seishi Fujiwara. Retrieved from https://idiyas.com/inventor/seishi-fujiwara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 95.7

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 116(Granted Patents)


Location History:

  • Tokyo, JP (2002)
  • Sagamihara, JP (1997 - 2017)

Company Filing History:


Years Active: 1997-2017

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Areas of Expertise:
Silica Glass
Optical Member
UV-Lithography
Durability
Synthetic Silica Glass
Projection Exposure Apparatus
Manufacturing Method
Image-Focusing Optical System
Excimer Laser
Fluorine-Containing Silica Glass
Optical System
Forming Method
23 patents (USPTO):Explore Patents

Title: Seishi Fujiwara: Pioneering Inventor from Sagamihara

Introduction: Seishi Fujiwara is a renowned inventor hailing from Sagamihara, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Seishi Fujiwara holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Seishi Fujiwara has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Seishi Fujiwara has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Seishi Fujiwara's passion for innovation and his relentless drive to push the boundaries of what is possible make him a true trailblazer in the world of inventions, inspiring the next generation of inventors to dream big and create a better future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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