The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Mar. 12, 2002
Applicant:
Inventors:
Hiroki Jinbo, Yokohama, JP;
Seishi Fujiwara, Sagamihara, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G02B 1/314 ; C03C 3/04 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G02B 1/314 ; C03C 3/04 ;
Abstract
An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.
Jinbo, Hiroki. (2003). Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus (U.S. Patent No. 6587181). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6587181
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile