The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Sep. 27, 2000
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 1/100 ;
U.S. Cl.
CPC ...
C03B 1/100 ;
Abstract
A silica glass forming method is a method of pressing a synthetic silica bulk having at least a set of opposed surfaces, on the surfaces under a high temperature condition by a presser, wherein an elastic member with permeability is placed between the presser and the surfaces of the synthetic silica bulk pressed by the presser and wherein the synthetic silica bulk is pressed through the elastic member by the presser. This method is able to reduce bubbles remaining inside the synthetic glass formed product after the forming to a sufficiently small amount. Therefore, it becomes feasible to provide the method that permits high-yield production of silica glasses with excellent optical characteristics.