The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2001
Filed:
Sep. 29, 1998
Applicant:
Inventors:
Hiroki Jinbo, Yokohama, JP;
Norio Komine, Sagamihara, JP;
Seishi Fujiwara, Sagamihara, JP;
Akiko Yoshida, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/06 ;
U.S. Cl.
CPC ...
C03C 3/06 ;
Abstract
A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5×10,molecules/cm,or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass.
Jinbo, Hiroki. (2001). Silica glass having superior durability against excimer laser beams and method for manufacturing the same (U.S. Patent No. 6174830). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6174830
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile