Location History:
- Kumamoto-Ken, JP (2003)
- Kikuchi-gun, JP (2003)
- Koshi-Machi, JP (2007)
- Koshi, JP (2009 - 2019)
- Kumamoto, JP (2013 - 2020)
Company Filing History:
Years Active: 2003-2020
Title: Seiki Ishida: Innovator in Substrate Processing Technology
Introduction
Seiki Ishida is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technology. With a total of 13 patents to his name, Ishida has made remarkable advancements in the field, particularly in the design and functionality of substrate processing apparatuses.
Latest Patents
Ishida's latest patents include innovative technologies such as a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features a first nozzle that ejects droplets of a chemical liquid toward the front surface of a substrate. This is achieved by mixing a gas supplied by a gas supply mechanism with a heated chemical liquid. Additionally, a second nozzle ejects heated deionized water toward the rear surface of the substrate, enhancing the processing efficiency. Another notable invention is the substrate liquid processing apparatus, which includes a substrate holding device that rotates the substrate while discharging processing liquid and drying gas, ensuring optimal substrate treatment.
Career Highlights
Seiki Ishida is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that improve substrate processing methods, thereby contributing to the overall efficiency of semiconductor production.
Collaborations
Ishida has collaborated with notable colleagues such as Taro Yamamoto and Yukiyoshi Saito, further enhancing the innovative capabilities within his field. Their combined expertise has led to the development of cutting-edge technologies that push the boundaries of substrate processing.
Conclusion
Seiki Ishida's contributions to substrate processing technology exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate treatment, making him a key figure in the industry.