Kokubunji, Japan

Seiichi Murayama

This inventor holds 33 USPTO granted patents, primarily in Plasma Technology. Top assignee: Hitachi, Ltd.. Active years: 1978-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiichi Murayama. Retrieved from https://idiyas.com/inventor/seiichi-murayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 12

Forward Citations = 409(Granted Patents)


Location History:

  • Kokubunji, JA (1978)
  • both Kokubunji, JP (1990)
  • Kokubunji, JP (1979 - 1994)

Company Filing History:


Years Active: 1978-1994

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Areas of Expertise:
X-Ray Exposure
Fluorescent Lamp
Plasma Source
Semiconductor Manufacturing
Thin Film Formation
Spectrometry
Discharge Lamp
Photo-Induced Reaction
Dry Etching
Magneto-Optic Effect
Temperature Control
Element Analyzer
33 patents (USPTO):Explore Patents

Title: Seiichi Murayama: Pioneering Inventor from Kokubunji

Introduction: Seiichi Murayama is a renowned inventor hailing from Kokubunji, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Seiichi Murayama holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: Throughout his illustrious career, Seiichi Murayama has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Seiichi Murayama has collaborated with top researchers and engineers from prestigious universities and research institutions worldwide, fostering a culture of innovation and knowledge-sharing.

Conclusion: Seiichi Murayama's dedication to pushing the boundaries of technology and his passion for creating solutions to complex problems make him a true visionary in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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