The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1994
Filed:
Jul. 06, 1992
Taro Ogawa, Kodaira, JP;
Kozo Mochiji, Hachioji, JP;
Seiichi Murayama, Kokubunji, JP;
Hiroaki Oizumi, Kokubunji, JP;
Takashi Soga, Hachioji, JP;
Seiji Yamamoto, Kokubunji, JP;
Isao Ochiai, Otsuki, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.