The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 1990
Filed:
May. 05, 1989
Applicant:
Inventors:
Yukio Okamoto, Sagamihara, JP;
Seiichi Murayama, Kokubunji, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912152 ; 21912148 ; 21912147 ; 21912136 ; 219 / ; 31511121 ;
Abstract
A microwave plasma production apparatus according to the present invention is so configured that a cylindrical coaxial wave guide is formed by a cylindrical outer conductor and a helical coil shaped inner conductor, and at least a part of a nonconductive discharge tube is disposed inside said inner conductor, microwave being applied between said outer conductor and said inner conductor.