Hitachi, Ltd.

Seiichi Murayama

Tetsuo Ono

Makoto Yasuda

Yoshio Watanabe

Yusuke Yajima

Masaru Ito

Yasuo Kato

Hiromitsu Matsuno

Kanji Tsujii

Manabu Yamamoto

Yoji Arai

Yukio Okamoto

Shigeo Mikoshiba

Tsune Miyashita

Masataka Koga

Isao Ochiai

Kounosuke Oishi

Kunifusa Kayama

Hideaki Koizumi

Kunio Harada

Kenji Sekine

Yasuo Wada

Kozo Mochiji

Takashi Soga

Tsutomu Komoda

Taro Ogawa

Hiroaki Oizumi

Yasusuke Seki

Hidekazu Okuhira

Akira Shintani

Churyo Kodama

Kazunori Kinoshita

Satoshi Shimura

Kenichi Kawasumi

Seiji Yamamoto

Shigeo Kubota

Atsuo Koyama

Fuzio Yamada

Makoto Watanabe

Kounosuke Ohishi

Hiromistu Mastuno

Tsuyoshi Kobayashi

In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.

X-ray exposure method with an X-ray mask comprising phase shifter

A fluorescent lamp has at least a pair of electrodes, at least two circular discharge tubes connected to said electrodes and enclosing rare gas and mercury therein, and a phosphor coating provided on an inside wall of each of said discharge tubes, the two circular discharge tubes being arranged coaxially circularly on one and the same plane, the diameter of each of the discharge tubes being selected to have a value within a range of from 5 mm to 25 mm both inclusive, the luminance on surface of each of the discharge tubes being selected to have a value within a range of from 2.times.10.sup.4 Cd/m.sup.2 to 6.times.10.sup.4 Cd/m.sup.2.

Circular fluorescent lamp

A plasma source mass spectrometer in which ions in a plasma generated in a high pressure (.ltoreq.1 atm) region are introduced into a low pressure (.ltoreq.10.sup.-5 Torr) region to analysis the ion mass includes a moderate pressure (.gtoreq.10.sup.-3 Torr) region which is provided between the high pressure region and the low pressure region. The plasma generated in the high pressure region is diffused to the moderate pressure region in order to produce a diffused plasma. Ions are extracted from the diffused plasma by an ion extraction electrode having an ion extraction opening. In the vicinity of the ion extraction opening a convex-shaped toward the diffused plasma whereby ion sheath is formed, whereby the ions can be extracted toward the low pressure region with a high efficiency.

Plasma source mass spectrometer

An equipment for manufacturing semiconductor devices has: a reaction chamber in which a substrate to be processed is placed; means for evacuating the reaction chamber; means for introducing a reaction gas into the reaction chamber; means for applying polarized light to the surface of the substrate for the purpose of depositing a thin film on the surface of the substrate using a photochemical reaction between the light and the reaction gas; and means for adjusting the direction of polarization of the light so as to be substantially perpendicular to the longitudinal axis of a stepped circuit pattern present on the surface of the substrate for the purpose of flattening the circuit pattern.

Equipment for manufacturing semiconductor devices

A light source apparatus for irradiating a large area with high intensity of light comprises a microwave cavity having a section of a flat shape and a plurality of electrodeless lamps disposed within the cavity in juxtaposition with one another in a flat array.

Apparatus for generating light by utilizing microwave

A microwave plasma production apparatus according to the present invention is so configured that a cylindrical coaxial wave guide is formed by a cylindrical outer conductor and a helical coil shaped inner conductor, and at least a part of a nonconductive discharge tube is disposed inside said inner conductor, microwave being applied between said outer conductor and said inner conductor.

Microwave plasma production apparatus

A plasma trace element spectrometer comprises a microwave generator for generating microwave power, a microwave feeder for guiding and transforming the generated microwave power into microwave power of TE.sub.01 mode and supplying the microwave power of TE.sub.01 mode, a plasma producer having, at one end, an introduction port for a carrier gas and a sample and at the other end an opening and being cooperative with the supplied microwave power of TE.sub.01 mode to produce plasma of the carrier gas and sample introduced through the introduction port, and a spectrometer for analyzing constituent elements of the sample by measuring the produced plasma by way of the opening.

Trace element spectrometry with plasma source

Disclosed is a low-pressure discharge lamp comprising a discharge vessel defining an airtight space therein, at least one pair of electrodes disposed in the discharge vessel, and discharge gases enclosed in the discharge vessel, one of the electrodes which acts as an anode being located in a zone of negative glow.

Low-pressure discharge lamp

A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.

Plasma X-ray source

Disclosed is a compact fluorescent lamp which comprises an airtight outer bulb filled with a rare gas and mercury; inner tube means provided within the outer bulb, said means having opening to a space of the inside of the outer bulb, and a coating formed onto at least one of an inner surface of said outer bulb and an outer surface of said inner tube means, said coating being so transparent as substantially not to scater visible rays and which consists of at least one material of an oxide and a phosphate. A compact fluorescent lamp mostly in the electric bulb shape of the present invention has been remarkably improved in the so-called lumen output maintenance without lowering of the initial lumen output.

Compact fluorescent lamp

A high-pressure discharge lamp operating circuit performs a low-frequency AC operating at an early stage of operating and thereafter performs a high-frequency AC operation or DC operation during the steady-state of lamp operation. This circuit comprises a circuit for effecting a transition from the low-frequency AC operation to the high-frequency AC operation or DC operation either at the time which is a predetermined time period after the ignition of discharge before the high-pressure discharge lamp reaches the steady-state of operation, or after having detected at least one of predetermined lamp characteristics, thereby providing a stabilized light output.

High-pressure discharge lamp operating circuit

An apparatus according to the present invention for thin film formation using a photo-induced chemical reaction comprises a reaction chamber in which a substrate can be set, means to introduce a reactive gas into the reaction chamber for the purpose of causing a surface of the substrate to adsorb the reactive gas, means to evacuate the reaction chamber, means to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucleus required for growing a film on the substrate surface, means to generate metastable excited molecules which can react with the reactive gas to decompose it, and means to introduce the reactive gas and the metastable excited molecules into the reaction chamber for the purpose of growing the film on the substrate formed with the nucleus on the basis of the nucleus.

Apparatus for thin film formation using photo-induced chemical reaction

A plasma X-ray source comprises inner and outer cylindrical electrodes disposed coaxially and with a certain distance with respect to each other, an electrical insulator disposed between end portions of the inner and outer cylindrical electrodes, and a discharge vessel disposed to envelop the inner and outer cylindrical electrodes. A pulse voltage is applied between the inner and outer cylindrical electrodes to produce plasma in the discharge vessel. An electrically conductive spherical shield is disposed to envelop a space where the plasma is pinched, and the spherical shield is maintained at a potential equal to that applied to the outer cylindrical electrode.

Plasma x-ray source

A low-pressure mercury vapor discharge lamp in which a rare gas and mercury are provided in an outer bulb, which in turn contains therein a plurality of bent inner tubes, each having an opening at an end and an electrode at the other end thereof. A starting probe is provided between the openings in the outer bulb. An operating circuit or starter is connected to the electrodes. Further, a starting probe circuit is connected to the starting probe to apply a high voltage to the starting probe at the time of ignition.

Low-pressure mercury vapor discharge lamp

A method of photochemically treating a surface of a material is disclosed which includes a step of introducing a reaction gas into a reaction chamber having a substrate therein, to make the reaction gas be adsorbed on the surface of the substrate, and a step of exposing the substrate to radiation of a wavelength at which the absorption of radiation energy by the reaction gas existing in the inner space of the reaction chamber is negligibly small and the radiation energy is absorbed by the reaction gas adsorbed on the surface of the substrate, wherein the kind of the reaction gas and the wavelength of the radiation are selected so that the surface of a predetermined material forming a pattern on the substrate can be selectively treated.

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Kokubunji, Japan

Seiichi Murayama