Company Filing History:
Years Active: 2001-2021
Title: Seethambal S Mani: Innovator in Photodetector Technology
Introduction
Seethambal S Mani is a prominent inventor based in Albuquerque, NM (US). He has made significant contributions to the field of photodetector technology, holding a total of 5 patents. His innovative approaches have paved the way for advancements in the fabrication of photosensitive devices.
Latest Patents
One of his latest patents is titled "Method of fabricating photosensitive devices with reduced process-temperature budget." This method involves fabricating a backside-illuminated photodetector by joining a device wafer to a readout wafer during an IC hybridization step. The process includes defining the device layer in the device wafer and forming an LPCVD layer over it, which can serve as a passivation layer or an antireflection coating. This innovative approach allows for high-quality layer fabrication without compromising the active devices.
Another notable patent is "Focal plane array with modular pixel array components for scalability." This patent describes a modular, scalable focal plane array composed of integrated circuit dice, each containing modular pixel array circuitry. The design effectively multiplies the amount of circuitry to create a larger pixel array while maintaining the desired pixel pitch through die stack interconnections.
Career Highlights
Seethambal S Mani has worked with reputable organizations such as Sandia Corporation and National Technology & Engineering Solutions of Sandia, LLC. His experience in these companies has contributed to his expertise in the field of photodetector technology.
Collaborations
Throughout his career, he has collaborated with notable individuals, including Randolph R Kay and Jeffry Joseph Sniegowski. These collaborations have further enhanced his innovative work and contributions to the industry.
Conclusion
Seethambal S Mani is a distinguished inventor whose work in photodetector technology has led to significant advancements in the field. His patents reflect his commitment to innovation and excellence in engineering.