Hillsboro, OR, United States of America

Sean W King

This inventor holds 32 USPTO granted patents and 3 published patent applications, primarily in Dielectric Materials. Top assignees: Intel Corporation, University of Missouri. Active years: 2004-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sean W King. Retrieved from https://idiyas.com/inventor/sean-w-king

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 32 

% Patents Active = 62.5

Average Co-Inventor Count = 2.7

ph-index = 8

Forward Citations = 652(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2004 - 2019)
  • Beaverton, OR (US) (2010 - 2024)

Company Filing History:


Years Active: 2004-2025

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Areas of Expertise:
Dielectric Barriers
Graphene Channels
Low-k Interconnects
Transistor Structures
Hermetic Layers
Amorphous Silicon
Multi-layer Films
Electromigration Performance
Planarized Structures
Selective Deposition
Interconnect Fabrication
Epitaxial Graphene
32 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Sean W. King in Dielectric Diffusion Barriers

Introduction

Sean W. King, an accomplished inventor based in Hillsboro, Oregon, has made significant strides in the field of materials science with a focus on dielectric materials. With a commendable portfolio of 30 patents, his work primarily revolves around conformal low-temperature hermetic dielectric diffusion barriers, which have applications in advanced electronic devices.

Latest Patents

Among his latest innovations, King has developed patents for "Conformal Low Temperature Hermetic Dielectric Diffusion Barriers." This technology encompasses conformal hermetic dielectric films designed to serve as dielectric diffusion barriers over three-dimensional topography. The patent outlines various embodiments that utilize a dielectric layer, such as a metal oxide, which is deposited via atomic layer deposition (ALD) techniques. This novel approach yields greater conformality and density compared to traditional silicon dioxide films obtained through PECVD processes. King's innovations include multi-layered films that incorporate high-k and low-k dielectric layers to minimize the dielectric constant of the diffusion barrier. Additionally, adjustments to the silicon content in metal silicate layers are explored to further enhance performance while maintaining desirable film properties.

Career Highlights

Sean W. King has had a fruitful career, contributing his expertise to renowned organizations such as Intel Corporation and The Curators of the University of Missouri. His experiences at these institutions have enabled him to refine his skills and apply his innovative concepts in practical settings, leading to his vast collection of patents.

Collaborations

Throughout his career, King has worked alongside prominent colleagues, including Hui Jae Yoo and Sreenivas Kosaraju. These collaborations have fostered an environment of creativity and innovation, allowing for the exploration of new ideas and technologies in the realm of dielectric materials.

Conclusion

Sean W. King stands out as a significant contributor to the field of materials science with his groundbreaking work on dielectric diffusion barriers. His inventive solutions are paving the way for advancements in electronic device manufacturing, proving his status as a notable inventor in the industry. As innovation continues to evolve, King's contributions will undoubtedly play a critical role in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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