Sean Reidy

Title: Sean Reidy: Innovator in Multiple Patterning Technologies

Introduction

Sean Reidy is a notable inventor based in Clifton Park, NY (US), recognized for his contributions to the field of semiconductor manufacturing. With a total of three patents to his name, Reidy has made significant advancements in multiple patterning techniques that are essential for modern electronics.

Latest Patents

Reidy's latest patents include innovative methods such as "Multiple patterning with mandrel cuts defined by block masks" and "Metal on metal multiple patterning." The first patent describes a process where a hardmask is deposited over an interlayer dielectric layer, followed by the formation of a mandrel. A block mask is then created to cover specific sections of the mandrel, allowing for the precise definition of patterns that are crucial for semiconductor fabrication. The second patent focuses on a structure that includes a first metal layer patterned as a mandrel, a dielectric spacer, and a second metal layer, showcasing Reidy's expertise in enhancing the efficiency of metal patterning processes.

Career Highlights

Throughout his career, Sean Reidy has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and GlobalFoundries U.S. Inc. His work has contributed to the development of advanced manufacturing techniques that are vital for producing cutting-edge electronic devices.

Collaborations

Reidy has collaborated with esteemed colleagues such as Hsueh-Chung Chen and Ravi Prakash Srivastava, further enhancing the innovative work being done in the field of semiconductor technology.

Conclusion

Sean Reidy's contributions to multiple patterning technologies have positioned him as a key figure in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in modern electronics manufacturing.