Globalfoundries Inc.

Globalfoundries U.S. Inc.

Sean Reidy

Hsueh-Chung Chen

Terry Allen Spooner

Ravi Prakash Srivastava

Nicholas V Licausi

Somnath Ghosh

Louis DeWolf Lanzerotti

Atsushi Ogino

Craig Child

Keith Donegan

Martin O'Toole

Brendan O'Brien

Methods of self-aligned multiple patterning. A hardmask is deposited over an interlayer dielectric layer. A mandrel is formed over the hardmask. A block mask is formed that covers a first lengthwise section of the mandrel and that exposes second and third lengthwise sections of the mandrel. After forming the block mask, the second and third lengthwise sections of the mandrel are removed to define a pattern including respective first and second mandrel lines that are separated from each other by the first lengthwise section of the mandrel. The first mandrel line and the second mandrel line expose respective portions of the hardmask, and the first lengthwise section of the mandrel line covers another portion of the hardmask. The pattern is transferred to the hardmask with an etching process, and subsequently transferred to the interlayer dielectric layer with another etching process.

Multiple patterning with mandrel cuts defined by block masks

The present disclosure relates to a structure which includes a first metal layer patterned as a mandrel, a dielectric spacer on the first metal layer, and a second metal layer on the dielectric spacer.

Metal on metal multiple patterning

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Clifton Park, NY, United States of America

Sean Reidy