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For the Inventor, By the Inventor

Seoul, South Korea

Se-wan Park

USPTO Granted Patents = 15

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 25(Granted Patents)


Company Filing History:

goldMedal15 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2017-2021

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15 patents (USPTO):Explore Patents
1. 10910373 - Semiconductor device having asymmetric fin-shaped pattern (2021-02-02),
2. 10868007 - Semiconductor device (2020-12-15),
3. 10692864 - Semiconductor device having asymmetric fin-shaped pattern (2020-06-23),
4. 10629597 - Semiconductor device (2020-04-21),
5. 10205023 - Semiconductor device including multi-channel active patterns (2019-02-12),
6. 10199377 - Semiconductor device having asymmetric fin-shaped pattern (2019-02-05),
7. 10157917 - Semiconductor device (2018-12-18),
8. 10074572 - Integrated circuit devices and methods of manufacturing the same (2018-09-11),
9. 10032886 - Semiconductor device (2018-07-24),
10. 9887194 - Semiconductor devices and methods of fabricating the same (2018-02-06),
11. 9859398 - Methods for fabricating semiconductor devices having fin-shaped patterns by selectively removing oxidized portions of the fin-shaped patterns (2018-01-02),
12. 9755074 - Semiconductor device including a multi-channel active pattern (2017-09-05),
13. 9673330 - Integrated circuit devices and methods of manufacturing the same (2017-06-06),
14. 9620406 - Methods for fabricating semiconductor devices having fin-shaped patterns by selectively removing oxidized fin-shaped patterns (2017-04-11),
15. 9601628 - Semiconductor device having asymmetric fin-shaped pattern (2017-03-21),

Title: Innovation Pioneer: Se-wan Park

Introduction

Se-wan Park is a notable inventor based in Seoul, South Korea, with an impressive portfolio of 15 patents. He is widely recognized for his contributions to the semiconductor industry, particularly in developing cutting-edge technologies that enhance device performance.

Latest Patents

Among his latest inventions is a revolutionary semiconductor device featuring an asymmetric fin-shaped pattern. This invention includes a first fin-shaped pattern with two sidewalls facing one another, complemented by a field insulating film that contacts part of the fin. The design is characterized by a boundary that distinguishes its upper and lower portions, critical for optimizing semiconductor functionality. His contributions also include designs for semiconductor devices that incorporate a gate electrode intersecting with the fin-type pattern, emphasizing performance through structural variations.

Career Highlights

Se-wan Park's career is marked by his tenure at Samsung Electronics Co., Ltd., where he has played a vital role in advancing semiconductor technology. His work is instrumental in shaping the future of high-performance electronics, making significant strides in both innovation and application in the tech field.

Collaborations

Throughout his career, Park has collaborated with talented colleagues, including Jung-Gun You and Baik-Min Sung. Together, they have pushed the boundaries of semiconductor research, fostering an environment of creativity and innovation within Samsung Electronics.

Conclusion

In conclusion, Se-wan Park exemplifies the spirit of innovation within the semiconductor industry. His numerous patents and collaborative efforts highlight his dedication to advancing technology and improving device efficacy. As the industry continues to evolve, Park remains a key figure driving these innovations forward.

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