Company Filing History:
Years Active: 2001-2004
Title: Scott Francis Shive: Innovator in Semiconductor Technology
Introduction
Scott Francis Shive is a notable inventor based in Orlando, FL (US), recognized for his contributions to semiconductor technology. With a total of 6 patents, Shive has made significant advancements in the field, particularly in the fabrication of MOS devices.
Latest Patents
One of his latest patents is titled "Method for fabricating MOS device with halo implanted region." This invention involves forming a halo implant for an MOS transistor in a semiconductor substrate at a shallow implant angle. The process includes creating a polysilicon gate structure over a gate oxide, followed by depositing a hard mask on the gate's upper surface. The mask is then etched to form a cap-shaped mask, allowing the dopant for the halo implant to penetrate to a depth that follows the contour of the cap. This innovative approach enables the formation of halo implants that extend under the gate structure without the complications of large angle implants. Another significant patent is "Alignment mark having a protective oxide layer for use with shallow trench isolation." This invention provides a semiconductor device with large topography alignment marks and outlines a method for manufacturing the device, which includes forming an isolation trench and an alignment mark in a substrate to a common depth.
Career Highlights
Throughout his career, Scott Shive has worked with several prominent companies, including Agere Systems, Guardian Corporation, and Lucent Technologies Inc. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Scott has collaborated with notable professionals in the field, including Alvaro Maury and Stephen Carl Kuehne. These collaborations have likely enriched his work and contributed to the development of his patents.
Conclusion
Scott Francis Shive is a distinguished inventor whose work in semiconductor technology has led to several important patents. His innovative methods for fabricating MOS devices and alignment marks demonstrate his commitment to advancing the field.