Sagamihara, Japan

Satoru Kawakami

This inventor holds 43 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Fuji Electric Co., Ltd., Tohoku University. Active years: 1995-2026.

USPTO Granted Patents = 43 

% Patents Active = 93.0

Average Co-Inventor Count = 3.1

ph-index = 11

Forward Citations = 885(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2000)
  • Sagamihara, JP (1995 - 2003)
  • Amagasaki, JP (2012)
  • Sendai, JP (2013)
  • Miyagi, JP (2016 - 2020)
  • Yamanashi, JP (2022 - 2024)
  • Nirasaki, JP (2024)

Company Filing History:


Years Active: 1995-2026

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Areas of Expertise:
Plasma Processing
Semiconductor Manufacturing
Substrate Processing
Film Forming
Microwave Plasma
Vacuum Processing
Plasma Treatment
Shower Plate
Dielectric Plates
Negative Ion Density
Electrostatic Force
Plasma Deposition
43 patents (USPTO):Explore Patents

Title: Satoru Kawakami: A Pioneer in Plasma Processing Technologies

Introduction

Satoru Kawakami, a notable inventor based in Sagamihara, Japan, has made significant contributions to the field of plasma processing. With an impressive portfolio of 30 patents, his work focuses on improving substrate processing systems that are vital in various industrial applications.

Latest Patents

Among his latest innovations are two critical patents: a plasma processing apparatus and a plasma processing method. The plasma processing apparatus is designed for effectively cleaning the peripheral portion of a substrate using plasma. This apparatus features a depressurizable processing container that houses a substrate supported by a substrate support. Key components include a central electrode, upper and lower ring electrodes, and a configuration for adjusting the phase of the RF power supplied to these electrodes. This structure ensures efficient and effective processing of substrates.

Additionally, his substrate processing apparatus integrates a vacuum processing container with a unique rotation arm, which has a rotary axis at its center. This configuration not only enhances the processing capabilities but also optimizes the exhaust path within the vacuum processing environment.

Career Highlights

Satoru Kawakami has had a distinguished career, notably working with Tokyo Electron Limited, where he contributed his expertise to advance plasma processing technologies. His innovative spirit and engineering skills have allowed him to develop state-of-the-art processing systems that meet evolving industry demands.

Collaborations

Throughout his career, Kawakami has collaborated with esteemed colleagues, including Taro Ikeda and Nobuo Ishii. These collaborations have enriched his work and facilitated the development of groundbreaking technologies that are integral to the semiconductor and material processing industries.

Conclusion

Satoru Kawakami's contributions to plasma processing technology underscore his status as a leading inventor in the field. His 30 patents, particularly in the areas of plasma processing apparatus and methods, reflect a deep commitment to innovation and excellence. As industries increasingly rely on advanced processing techniques, Kawakami's work will continue to play a crucial role in shaping the future of substrate processing.

Profile summary based on public USPTO records.
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