The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2024
Filed:
Jan. 18, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kiyoshi Mori, Fuchu, JP;
Satoru Kawakami, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/44 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67184 (2013.01); C23C 16/4412 (2013.01); H01L 21/67742 (2013.01); H01L 21/68764 (2013.01);
Abstract
A substrate processing apparatus includes a vacuum processing container and a rotation arm including a rotary axis disposed at a central portion of the vacuum processing container, wherein, in the rotation arm, a rotation cylinder having a hollow interior constitutes the rotary axis, and a hollow portion of the rotation cylinder constitutes an exhaust path of the vacuum processing container.