Tokyo, Japan

Satomi Inoue

This inventor holds 42 USPTO granted patents and 8 published patent applications, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation, Nippon Telegraph and Telephone Corporation. Active years: 2013-2026.

USPTO Granted Patents = 42 

% Patents Active = 95.2

Average Co-Inventor Count = 4.4

ph-index = 5

Forward Citations = 65(Granted Patents)


Location History:

  • Kudamatsu, JP (2013 - 2019)
  • Tokyo, JP (2015 - 2024)

Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Plasma Processing Apparatus
Data Processing Method
Communication System
Control Device
Semiconductor Manufacturing
Etching Apparatus
Vacuum Processing
Operational Method
Analysis Method
Processing Chamber
Control Simulator
Data Processing Apparatus
42 patents (USPTO):Explore Patents

Title: **Innovations by Satomi Inoue: A Spotlight on His Patents and Career**

Introduction

Satomi Inoue, based in Tokyo, Japan, is a prolific inventor with an impressive portfolio of 38 patents. His innovative contributions span various fields, showcasing his expertise in advanced technologies. Inoue’s work reflects a commitment to pushing boundaries and creating impactful solutions in the realm of plasma processing and communication systems.

Latest Patents

Among Satomi Inoue's latest patents are the **Plasma Processing Apparatus** and the **Plasma Processing System**. The plasma processing apparatus features a plasma processing unit responsible for conducting plasma processing on samples, complemented by a control unit. This control unit adeptly selects from multiple prediction models to forecast outcomes based on the state of the plasma processing unit. Another notable invention is his **Communication System and Communication Method**, which employs a chaining edge router to efficiently redirect packets received through various inflow Virtual Routing and Forwarding (VRF) instances to a corresponding chain VRF. This innovative system ensures seamless communication via pre-constructed VLANs in accordance with specific route patterns.

Career Highlights

Throughout his career, Satomi Inoue has made significant contributions while working with reputable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His involvement with these organizations has afforded him the opportunity to refine his innovative capabilities and collaborate on cutting-edge projects.

Collaborations

Inoue has collaborated with prominent professionals in the field, including Shigeru Nakamoto and Daisuke Shiraishi. These partnerships have enhanced his work and fostered an environment of shared creativity and technical advancement.

Conclusion

In summary, Satomi Inoue's substantial number of patents and his innovative spirit reflect his dedication to advancing technology. His work in plasma processing and communication has not only impacted his companies but has also contributed to the broader technological landscape, illustrating the vital role of inventors in shaping the future.

Profile summary based on public USPTO records.
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