Location History:
- Bosie, ID (US) (2004)
- Boise, ID (US) (1999 - 2009)
- Cupertino, CA (US) (2010)
Company Filing History:
10 out of 38,068 
1 out of 832,966 Years Active: 1999-2010
Title: The Innovative Contributions of Satish Bedge
Introduction
Satish Bedge is a notable inventor based in Boise, ID (US), recognized for his significant contributions to the field of semiconductor technology. With a total of 11 patents to his name, he has developed innovative methods that enhance the efficiency and effectiveness of various processes in the industry.
Latest Patents
One of his latest patents is titled "Method of substantially uniformly etching non-homogeneous substrates." This invention provides a method for uniformly etching oxides from non-homogeneous substrates using a non-aqueous etchant that includes an organic solvent and a fluorine-containing compound. The fluorine-containing compound may consist of HF, HF:NHF, (NH)HF, or TMAF:HF, among others. This method is particularly useful for chemically non-homogeneous layers, such as shallow trench isolation fill oxide layers, or layers with varying composition or density at different depths.
Another significant patent is "Passivation for cleaning a material." This process involves defining a contact by etching an opening into borophosphosilicate glass (BPSG) down to a silicon substrate. The cleaning process is designed to remove native oxide at the bottom of the contact while minimizing the impact on the BPSG. The contact is treated with an etch retardant before being immersed in a cleaning solution that contains both the etch retardant and an etchant. The results of this cleaning process can be illustrated graphically, showing a marked improvement in contact diameter as a function of dip time.
Career Highlights
Throughout his career, Satish Bedge has worked with prominent companies, including Micron Technology Incorporated. His work has significantly impacted the semiconductor industry, leading to advancements in manufacturing processes and materials.
Collaborations
Satish has collaborated with several talented individuals, including Kevin J Torek and Whonchee Lee. These collaborations have fostered innovation and contributed to the successful development of his patented technologies.
Conclusion
Satish Bedge's innovative work and numerous patents reflect his dedication to advancing semiconductor technology. His contributions continue to influence the industry and inspire future innovations.