The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Aug. 22, 2005
Janos Fucsko, Boise, ID (US);
Grady Waldo, Boise, ID (US);
Bob Carstensen, Boise, ID (US);
Satish Bedge, Cupertino, CA (US);
Janos Fucsko, Boise, ID (US);
Grady Waldo, Boise, ID (US);
Bob Carstensen, Boise, ID (US);
Satish Bedge, Cupertino, CA (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of substantially uniformly etching oxides from non-homogeneous substrates is provided. The method utilizes a substantially non-aqueous etchant including an organic solvent and a fluorine-containing compound. The fluorine containing compound may include HF, HF:NHF, (NH)HF, or TMAF:HF and mixtures thereof. The etchant may be applied to chemically non-homogeneous layers such as shallow trench isolation fill oxide layers, or to layers having a non-homogeneous composition or density at different depths within the layers, such as spin-on-glass or spin-on-dielectric films.