Location History:
- Midland, MI (US) (2009 - 2012)
- Shanghai, CN (2012 - 2013)
Company Filing History:
4 out of 2,921 
1 out of 1,236 Years Active: 2009-2013
Title: Sanlin Hu - Innovator in Silsesquioxane Resin Systems
Introduction: Sanlin Hu is a noteworthy inventor based in Shanghai, China, recognized for his contributions in the field of silsesquioxane resin systems. With a portfolio of four patents, he has made significant strides in developing compositions that have vital applications in the photolithographic industry.
Latest Patents: Sanlin's latest patents revolve around silsesquioxane-based compositions, which include two notable inventions:
1. The first patent describes a composition that contains silsesquioxane resins with HSiO and RSiO units, where R is an acid dissociable group, along with 7-diethylamino-4-methylcoumarin. This innovation is particularly useful as a positive resist composition in forming patterned features on substrates for multi-layer photolithographic applications at 193 nm and 157 nm.
2. The second patent features silsesquioxane compositions incorporating silsesquioxane resins with HSiO3/2 units and other organic base additives. These additives, while not including 7-diethylamino-4-methylcoumarin, are selected from bulky tertiary amines, imides, amides, and polymeric amines that contain electron-attracting groups. This composition is similarly beneficial in the development of positive resist materials for advanced photolithographic applications.
Career Highlights: Sanlin Hu has enjoyed a distinguished career, having worked with prominent companies in the industry. His experience includes roles at Dow Corning Corporation and Tokyo Ohka Kogyo Co., Ltd., where he contributed to the advancement of innovative materials and technologies.
Collaborations: Throughout his career, Sanlin has collaborated with notable professionals, including Eric S. Moyer and Sheng Wang. These collaborations have bolstered his work in developing cutting-edge materials and improving photolithographic processes.
Conclusion: Sanlin Hu stands out as an innovative inventor with a strong focus on silsesquioxane resin systems that have important implications for the future of photolithography. His collection of patents showcases his commitment to advancing materials science, making him a significant figure in the industry.