The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Jun. 27, 2007
Applicants:
Sanlin HU, Shanghai, CN;
Eric Scott Moyer, Midland, MI (US);
Inventors:
Sanlin Hu, Shanghai, CN;
Eric Scott Moyer, Midland, MI (US);
Assignees:
Dow Corning Corporation, Midland, MI (US);
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-Shi, Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract
A silsesquioxane-based composition that contains (a) silsesquioxane resins that contain HSiOunits and RSiOunits wherein; R is an acid dissociable group, and (b) 7-diethylamino-4-methylcoumarin. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer (i.e. bilayer) 193 nm & 157 nm photolithographic applications.