The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Sep. 20, 2005
Applicants:
Sanlin HU, Midland, MI (US);
Sina Maghsoodi, Midland, MI (US);
Eric Scott Moyer, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Inventors:
Sanlin Hu, Midland, MI (US);
Sina Maghsoodi, Midland, MI (US);
Eric Scott Moyer, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/00 (2006.01); G03F 1/00 (2006.01); C08G 77/00 (2006.01); C08G 77/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition comprising (A) a hydrogen silsesquioxane resin, (B) an acid dissociable group-containing compound, (C) a photo-acid generator, (D) an organic solvent and optionally (E) additives. The resist composition has improved lithographic properties (such as high etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist.