The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Jun. 30, 2004
Sanlin HU, Midland, MI (US);
Eric Scott Moyer, Midland, MI (US);
Sheng Wang, Midland, MI (US);
David Lee Wyman, Midland, MI (US);
Sanlin Hu, Midland, MI (US);
Eric Scott Moyer, Midland, MI (US);
Sheng Wang, Midland, MI (US);
David Lee Wyman, Midland, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for in-corporating the fluorinated or non-fluorinated functional groups onto silsesquioxane backbone. The silsesquioxane resins of this invention has the general structure (HSiO)(RSiO)wherein; R is an acid dissociable group, a has a value of 0.2 to 0.9 and b has a value of 0.1 to 0.8 and 0.9≦a+b≦1.0.