Sang-jin An

Title: The Innovative Contributions of Sang-jin An

Introduction

Sang-jin An is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative etching methods. With a total of 3 patents to his name, An continues to push the boundaries of what is possible in semiconductor fabrication.

Latest Patents

Sang-jin An's latest patents include an etching method using a remote plasma source and a method of fabricating a semiconductor device that incorporates this etching method. The first patent details a process where plasma is generated by supplying a process gas to at least one remote plasma source (RPS) and applying power to it. This method allows for the etching of a first material film, such as SiNx, by introducing the plasma along with control gases like HBr, HCl, HI, NH, SiH, CHF, and others into a process chamber. His second patent focuses on an etching method using plasma, which involves generating plasma by supplying process gases to an RPS and etching an object by introducing water and the plasma into the process chamber.

Career Highlights

Sang-jin An is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to develop and refine his innovative etching techniques, contributing to advancements in semiconductor manufacturing.

Collaborations

Throughout his career, An has collaborated with notable colleagues, including Vladimir Volynets and Gon-jun Kim. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Sang-jin An's contributions to semiconductor technology through his innovative etching methods have positioned him as a key figure in the industry. His work continues to influence the future of semiconductor fabrication, showcasing the importance of innovation in technology.