logo

For the Inventor, By the Inventor

Taipei, Taiwan

San-De Tzu

USPTO Granted Patents = 41

Average Co-Inventor Count = 2.3

ph-index = 10

Forward Citations = 354(Granted Patents)


Location History:

  • Hsin-Chu, TW (1999)
  • Taipei, TW (1998 - 2008)

Company Filing History:

goldMedal41 out of 40,927 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 1998-2008

Loading Chart...
Areas of Expertise:
Phase Shift Masks
Electron Beam Lithography
Optical Proximity Correction
Sub-Resolution Patterns
Attenuated Phase Shifting Masks
Chrome Mask Etching
Mask Fabrication Processes
E-Beam Direct Writing
Memory Cell Patterning
Synchronized Implant Processes
Proximity Effect Minimization
Chemical Treatment Methods
41 patents (USPTO):Explore Patents
1. 7445159 - Dual trench alternating phase shift mask fabrication (2008-11-04),
2. 7033947 - Dual trench alternating phase shift mask fabrication (2006-04-25),
3. 6872507 - Radiation correction method for electron beam lithography (2005-03-29),
4. 6830853 - Chrome mask dry etching process to reduce loading effect and defects (2004-12-14),
5. 6830702 - Single trench alternating phase shift mask fabrication (2004-12-14),
6. 6720116 - Process flow and pellicle type for 157 nm mask making (2004-04-13),
7. 6660653 - Dual trench alternating phase shift mask fabrication (2003-12-09),
8. 6632590 - Enhance the process window of memory cell line/space dense pattern in sub-wavelength process (2003-10-14),
9. 6631307 - Use of logical operations in place of OPC software (2003-10-07),
10. 6630408 - Self alignment process to fabricate attenuated shifting mask with chrome border (2003-10-07),
11. 6495297 - Type mask for combining off axis illumination and attenuating phase shifting mask patterns (2002-12-17),
12. 6432588 - Method of forming an improved attenuated phase-shifting photomask (2002-08-13),
13. 6423455 - Method for fabricating a multiple masking layer photomask (2002-07-23),
14. 6403267 - Method for high transmittance attenuated phase-shifting mask fabrication (2002-06-11),
15. 6301698 - Method for creating the sub-resolution phase shifting pattern for outrigger type phase shifting masks (2001-10-09),

Title: Innovations by San-De Tzu: A Leader in Phase Shift Mask Fabrication

Introduction: San-De Tzu, a prominent inventor based in Taipei, Taiwan, has made significant contributions to the field of semiconductor manufacturing. With an impressive portfolio of 41 patents, Tzu is known for his groundbreaking work, particularly in the fabrication of phase shift masks (PSMs).

Latest Patents: One of San-De Tzu's latest patents revolves around the fabrication of a dual-trench alternating phase shift mask. This innovative method incorporates a chromium layer atop a mask layer, which rests on a quartz layer. The process involves a meticulous patterning approach according to semiconductor designs. Initial dry etching is performed on the mask layer in accordance with deep trenches of the PSM design. Subsequently, the quartz layer undergoes multiple dry etching cycles, utilizing a photoresist layer and backside ultraviolet exposure to achieve precision in patterning both deep and shallow trenches of the PSM design.

Career Highlights: Throughout his career, San-De Tzu has demonstrated a deep commitment to advancing semiconductor technology. His work at Taiwan Semiconductor Manufacturing Company Limited has positioned him as a key player in the industry. Tzu's expertise in layer fabrication processes has facilitated enhanced performance and efficiency in semiconductor devices.

Collaborations: San-De Tzu has collaborated with several notable professionals in the field, including Chia-Hui Lin and Wei-Zen Chou. Together, they have contributed to innovative projects that further highlight the importance of teamwork in the realm of technological advancements.

Conclusion: With 41 patents to his name, San-De Tzu continues to be an influential figure in the field of semiconductor manufacturing. His latest innovations, particularly in dual-trench phase shift mask fabrication, exemplify his dedication to enhancing technology in the industry. As semiconductor technology evolves, Tzu's contributions will undoubtedly play a vital role in shaping its future.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…