The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Sep. 01, 1999
Chia-Hui Lin, Hsin-Chu, TW;
San-De Tzu, Taipei, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A method is described for using computer aided design data for contact holes in a background, such as an opaque background or a phase shifting background, to generate computer aided design data for fabricating a mask an outrigger pattern. The outrigger pattern mask has contact holes surrounded by a first border of opaque material and the first border of opaque material surrounded by a third border of attenuating or 100% transmittance phase shifting material. The third border of attenuating or 100% transmittance phase shifting material is surrounded by opaque material. The design data for the contact hole pattern, a background pattern, a first correction pattern, and a second correction pattern are combined in a computer processor to generate final data. The final data is used to fabricate the mask.