Location History:
- San Jose, CA (US) (1998)
- Milpitas, CA (US) (2002 - 2003)
Company Filing History:
Years Active: 1998-2003
Title: Innovations by Sameer Parab in Semiconductor Technology
Introduction
Sameer Parab is a notable inventor based in Milpitas, California. He has made significant contributions to the field of semiconductor technology, holding three patents to his name. His work primarily focuses on enhancing the performance and efficiency of silicon on insulator (SOI) substrates.
Latest Patents
Sameer Parab's latest patents include a groundbreaking method for creating a reduced substrate capacitance high-performance SOI process. This innovation involves a silicon on insulator substrate that consists of a handle wafer, a layer of bonding material, and a device wafer. The device wafer features at least one buried impurity region that extends from the bonding layer into the device wafer, along with an epitaxial silicon layer on its second surface. This configuration allows for a minimal possible thickness of the silicon on insulator substrate.
Another patent by Parab outlines a method for forming a semiconductor substrate. This method includes several sequential steps: providing a handle wafer and a device wafer, implanting a first impurity region in the device wafer's first surface, bonding the device wafer to the handle wafer with a silicon dioxide layer, removing a portion of the device wafer, and forming an epitaxial silicon layer on the second surface. This process also enables the device wafer to maintain a minimal thickness.
Career Highlights
Sameer Parab is currently employed at Elantec Semiconductor, Inc., where he continues to innovate in the semiconductor industry. His expertise and contributions have positioned him as a valuable asset to his company and the field at large.
Collaborations
One of his notable coworkers is Mark A. Salsbery, with whom he has likely collaborated on various projects within the semiconductor domain.
Conclusion
Sameer Parab's work in semiconductor technology, particularly in developing high-performance silicon on insulator processes, showcases his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving semiconductor efficiency and performance.