The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 1998
Filed:
Oct. 03, 1996
Sameer Parab, San Jose, CA (US);
Mark A Salsbery, San Jose, CA (US);
Elantec Semiconductor, Inc., Milpitas, CA (US);
Abstract
A liquid etch apparatus including an outer tank for holding a liquid etch solution, which has included therein an inner cylindrical member positioned in the outer tank. At one end of the inner cylindrical member, a sparger or other gas supply means may be provided. Filters are provided between the inner cylindrical member and the outer tank. Substrates are secured in the inner tank and a propeller is provided below the substrates. Gas is introduced into the inner cylindrical member during the etch process which creates a pressure gradient between the inner tank and the outer tank, forcing particulate matter carried by the gaseous particles to circulate around to the filters.