Company Filing History:

29 out of 42,485

Hitachi, Ltd.

patents

1 out of 153

Kokusai Electric Co., Ltd.

patents

2 out of 832,680

Other

patents

Years Active: 1978-2004

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32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6767782 - Manufacturing method of semiconductor device (2004-07-27),

2. 6309980 - Semiconductor integrated circuit arrangement fabrication method (2001-10-30),

3. 6074958 - Semiconductor integrated circuit arrangement fabrication method (2000-06-13),

4. 5962347 - Semiconductor integrated circuit arrangement fabrication method (1999-10-05),

5. 5874013 - Semiconductor integrated circuit arrangement fabrication method (1999-02-23),

6. 5705029 - Dry etching method (1998-01-06),

7. 5643473 - Dry etching method (1997-07-01),

8. 5580420 - Plasma generating method and apparatus and plasma processing method and (1996-12-03),

9. 5354416 - Dry etching method (1994-10-11),

10. 5147500 - Dry etching method (1992-09-15),

11. 5127987 - Continuous etching process and apparatus therefor (1992-07-07),

12. 4992136 - Dry etching method (1991-02-12),

13. 4986877 - Method of dry etching (1991-01-22),

14. 4985114 - Dry etching by alternately etching and depositing (1991-01-15),

15. 4943344 - Etching method (1990-07-24),

Title: Innovations by Sadayuki Okudaira in Semiconductor Technology

Introduction

Sadayuki Okudaira, a prominent inventor based in Ome, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 32 patents, his work has impacted the development and manufacturing of advanced semiconductor devices.

Latest Patents

Among his latest patents, one notable invention is the manufacturing method of a semiconductor device. This innovative approach focuses on a semiconductor integrated circuit arrangement fabrication method. It aims to achieve etching with a high selection ratio and accuracy during the fabrication of large-scale integrated circuits (LSI). The method involves accurate control of the composition of dissociated species of a reaction gas during dry-etching on a semiconductor substrate. This is accomplished by generating an inert gas that is excited to a metastable state in plasma and having it interact with a fluorine gas to selectively obtain the desired dissociated species.

Career Highlights

Throughout his career, Sadayuki Okudaira has worked with several influential companies, including Hitachi, Ltd. His extensive experience in the semiconductor industry has been instrumental in the advancement of various technologies, reflecting his dedication to innovation and excellence in this field.

Collaborations

Okudaira's journey has been enriched by collaborations with esteemed coworkers, including Keizo Suzuki and Shigeru Nishimatsu. Together, they have contributed to groundbreaking advancements that have shaped the semiconductor landscape.

Conclusion

Sadayuki Okudaira's contributions to semiconductor technology through his innovative patents and collaborations showcase the vital role inventors play in advancing industries. His work not only elevates the standards for semiconductor manufacturing but also inspires future generations of inventors to continue pushing the boundaries of innovation.

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