This inventor holds 3 USPTO granted patents. Top assignee: Ebara Corporation. Active years: 2003-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003-2004
Title: Innovations of Sachiko Kihara
Introduction
Sachiko Kihara is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of technology, particularly in the area of substrate processing. With a total of 3 patents to her name, Kihara's work has had a notable impact on the industry.
Latest Patents
Kihara's latest patents include a method and apparatus for etching ruthenium films. This innovative method allows for the effective etching of ruthenium films that are formed on or adhere to various regions of a substrate. The process utilizes a chemical liquid with a pH of not less than 12 and an oxidation-reduction potential of not less than 300 mVvsSHE. Another significant patent is her method of and apparatus for cleaning substrates. This apparatus continuously supplies an acid solution to the central portion of a substrate's surface while it rotates, ensuring thorough cleaning.
Career Highlights
Kihara is currently employed at Ebara Corporation, where she continues to develop her innovative ideas. Her work has been instrumental in advancing substrate processing technologies, making her a valuable asset to her company.
Collaborations
Some of her notable coworkers include Ichiro Katakabe and Haruko Ohno, who have collaborated with her on various projects.
Conclusion
Sachiko Kihara's contributions to the field of technology through her patents and innovative methods highlight her expertise and dedication as an inventor. Her work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile