The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
Nov. 20, 2001
Applicant:
Inventors:
Akira Fukunaga, Tokyo, JP;
Haruko Ohno, Tokyo, JP;
Ichiro Katakabe, Tokyo, JP;
Sachiko Kihara, Tokyo, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; C03C 1/500 ; C03C 2/568 ; C23F 1/00 ; C25F 3/00 ;
U.S. Cl.
CPC ...
B44C 1/22 ; C03C 1/500 ; C03C 2/568 ; C23F 1/00 ; C25F 3/00 ;
Abstract
There is provided a method and apparatus for etching a ruthenium film which can sufficiently etch away a ruthenium film formed on or adhering to the peripheral region, especially a no-device-formed region, backside or other portions of a substrate. The method comprises etching a ruthenium film formed on a substrate with a chemical liquid having a pH of not less than 12 and an oxidation-reduction potential of not less than 300 mVvsSHE.