Tokyo, Japan

Haruko Ohno


Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2003-2004

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3 patents (USPTO):Explore Patents

Title: Innovations of Haruko Ohno: A Pioneer in Ruthenium Film Technologies

Introduction: Haruko Ohno is a notable inventor based in Tokyo, Japan, recognized for his contributions to the field of materials science, particularly in the area of ruthenium film technologies. With three patents to his name, Ohno has made significant advancements that have the potential to enhance various industrial applications.

Latest Patents: Haruko Ohno's latest patents include a "Method and Apparatus for Etching Ruthenium Films," which details a technique that effectively etches away ruthenium films adhering to various parts of a substrate. This innovative method utilizes a chemical liquid with a pH of not less than 12 and an oxidation-reduction potential of no less than 300 mV vs SHE. Furthermore, another significant patent by Ohno is a "Method of and Apparatus for Cleaning a Substrate," designed to supply an acid solution continuously to the central portion of a substrate's surface while rotating. This apparatus also introduces an oxidizing agent solution to enhance the cleaning process and is characterized by its ability to optimize substrate cleaning efficacy.

Career Highlights: Haruko Ohno is currently employed at Ebara Corporation, a leading company specializing in advanced technology solutions. Throughout his career, Ohno has developed cutting-edge techniques that have the potential to revolutionize the fabrication processes in various high-tech industries.

Collaborations: In his innovative journey, Ohno has collaborated with notable colleagues, including Ichiro Katakabe and Sachiko Kihara. These partnerships have facilitated a dynamic exchange of ideas and expertise, contributing to the successful development of their impactful inventions.

Conclusion: Haruko Ohno represents the spirit of innovation within the technology sector. His patents reflect a commitment to advancing materials science and engineering practices. With a strong foundation in research and collaboration, Ohno continues to drive progress in his field, inspiring both current and future generations of inventors.

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