Company Filing History:
Years Active: 2016-2017
Title: Ryuuu Ishita: Innovator in Etching Methods
Introduction
Ryuuu Ishita is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of etching methods, holding a total of 4 patents. His innovative approaches have advanced the technology used in plasma processing apparatuses.
Latest Patents
One of his latest patents is an etching method that allows for the simultaneous etching of first and second regions of a workpiece. This method involves a multilayered film composed of alternating silicon oxide and silicon nitride films. The etching process utilizes plasma generated from a first processing gas that includes fluorocarbon gas, hydrofluorocarbon gas, and oxygen gas. Following this, plasma from a second processing gas containing similar components along with a halogen-containing gas is generated. Finally, plasma from a third processing gas containing oxygen is produced to complete the etching process.
Another notable patent is an etching method specifically designed for multilayered films. This method involves generating plasma within a processing vessel and supplying a first processing gas that includes hydrogen gas, hydrogen bromide gas, and various fluorocarbon gases. The innovative approach allows for precise etching of multilayered films, enhancing the efficiency of the process.
Career Highlights
Ryuuu Ishita is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced etching techniques that are crucial for modern electronics.
Collaborations
Throughout his career, Ryuuu has collaborated with talented individuals such as Yusuke Saitoh and Rui Takahashi. These collaborations have fostered a creative environment that has led to groundbreaking innovations in etching methods.
Conclusion
Ryuuu Ishita's contributions to the field of etching methods demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of plasma processing technology, making him a valuable asset in the industry.