Miyagi, Japan

Ryukichi Shimizu

This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2012-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryukichi Shimizu. Retrieved from https://idiyas.com/inventor/ryukichi-shimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Nirasaki, JP (2012)
  • Tokyo, JP (2013)
  • Miyagi, JP (2016)

Company Filing History:


Years Active: 2012-2016

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryukichi Shimizu

Introduction

Ryukichi Shimizu is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced methods for pattern formation and substrate processing systems.

Latest Patents

Shimizu's latest patents include a method of forming a pattern and a substrate processing system. The first patent describes a method that involves an etching step to create a predetermined pattern in a silicon-containing film. This is achieved by etching the film deposited on a substrate through a mask using plasma generated from an etching gas containing a fluorocarbon gas. Additionally, a film deposition step is included, where a silicon oxide film or a silicon nitride film is deposited on the surface of the predetermined pattern. This is done by oxidizing or nitriding a silicon-containing layer adsorbed on the surface of the pattern using a silicon compound gas and plasma from an oxidation or nitriding gas.

The second patent focuses on contact processing using multi-input/multi-output (MIMO) models. This invention provides systems and methods for creating Double Pattern (DP) structures on a patterned wafer in real-time. It utilizes Dual Pattern Contact-Etch (DPCE) processing sequences and associated Contact-Etch-Multi-Input/Multi-Output (CE-MIMO) models. The DPCE processing sequences can include various procedures for contact-etching, measurement, modeling, and verification, all aimed at enhancing the efficiency of Double Patterning (DP) procedures.

Career Highlights

Ryukichi Shimizu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that are critical for modern electronics.

Collaborations

Shimizu has collaborated with notable colleagues, including Daniel Joseph Prager and Merritt Funk. Their combined expertise has contributed to the innovative developments in semiconductor processing.

Conclusion

Ryukichi Shimizu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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