Takamatsu, Japan

Ryuji Ohnishi

This inventor holds 2 USPTO granted patents. Top assignee: Futec Inc.. Active years: 1990-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuji Ohnishi. Retrieved from https://idiyas.com/inventor/ryuji-ohnishi-ufa2268p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1990-1991

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovations of Ryuji Ohnishi: A Pioneer in Pattern Detection Technology

Introduction

Ryuji Ohnishi is a notable inventor based in Takamatsu, Japan, with a focus on advancements in detection technology. His innovative work has led to the granting of two significant patents, which have the potential to enhance the quality control processes within various manufacturing sectors.

Latest Patents

Ohnishi's latest patents showcase his expertise in detecting discrepancies in printed patterns and significant differences in sheet materials. The first patent, titled "Method and apparatus for detecting disparity of cyclic length of printed," describes a comprehensive method for identifying variations in cyclic lengths of printed patterns. This process involves scanning sheets with predetermined patterns, extracting outline data, and comparing the retrieved data to determine any disparities in the printed output.

The second patent, "Method and apparatus for detecting significant difference of sheet," provides a systematic approach to identifying defects in materials. The method utilizes a camera to scan sheets, extracting the outlines of both the images and any detected defects. By comparing the outline data from different cycles, it offers a mechanism for revealing significant changes in quality or consistency, essential for maintaining high production standards.

Career Highlights

Ryuji Ohnishi has made significant contributions to Futec Inc., where he currently applies his innovative ideas to solve complex challenges in the field of imaging technology. His work focuses on improving detection methods that are crucial for ensuring high-quality products in manufacturing processes.

Collaborations

Throughout his career, Ohnishi has collaborated with various professionals and organizations to refine his inventions and implement them effectively in industrial applications. This collaborative spirit has not only advanced his innovations but also contributed to broader improvements in the print manufacturing sector.

Conclusion

Ryuji Ohnishi stands out as a remarkable inventor whose patents reflect a commitment to enhancing detection methods within manufacturing processes. His innovative approaches and dedicated work at Futec Inc. highlight the importance of continuous development in the realm of technology and quality assurance. As industries evolve, the impact of Ohnishi's inventions will undoubtedly remain influential, paving the way for future advancements in pattern detection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…