The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1991
Filed:
Feb. 22, 1991
Ryuji Ohnishi, Takamatsu, JP;
Futec, Inc., Kagawa, JP;
Abstract
A method of detecting a disparity in a cyclic length of a printed pattern includes the steps of scanning a to-be-checked sheet on which predetermined patterns are cyclically printed in the longitudinal direction by an electronic camera to obtain image data corresponding to a pattern, extracting outline data representing an outline of the pattern from the image data, writing the outline data extracted in the extraction step into a memory with a predetermined cycle in accordance with travel position data of the to-be-checked sheet, reading out the outline data, and comparing first outline data for one cycle read out from the memory and second outline data which is read out after the first outline data is read out. Disparity of a cyclic length of the pattern is detected based on a correlation between the first and second outline data, e.g., a coincidence or noncoincidence therebetween, in accordance with the comparison result in the comparison step.