Hikari, Japan

Ryouji Hamasaki


Average Co-Inventor Count = 6.5

ph-index = 3

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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3 patents (USPTO):Explore Patents

Title: Ryouji Hamasaki: A Pioneer in Innovation

Introduction:

Ryouji Hamasaki, a visionary inventor hailing from Hikari, Japan, has made significant contributions to the world of technology through his relentless pursuit of innovation and his boundless passion for pushing the boundaries of what is deemed possible.

Latest Patents:

Hamasaki's latest patents include the "Method and Apparatus for Treating Surface of Semiconductor," revolutionizing the process of surface treatment in semiconductor manufacturing. The innovative approach involves plasma etching to process fine patterns with exceptional precision, allowing for a minimum feature size of 1 μm or smaller.

Career Highlights:

With a total of 3 patents to his name, Hamasaki's impact in the field of technology is undeniable. He is currently affiliated with Hitachi, Ltd., a renowned technology company known for its groundbreaking advancements in various sectors. Hamasaki's expertise and dedication have led to the development of cutting-edge technologies that have reshaped the industry.

Collaborations:

Throughout his career, Hamasaki has collaborated with esteemed colleagues such as Tetsuo Ono and Tatsumi Mizutani, further amplifying the impact of his innovative endeavors. Their collective efforts have fostered a culture of collaboration and excellence, driving forward groundbreaking solutions in the realm of technology.

Conclusion:

Ryouji Hamasaki stands as a true pioneer in the world of technology, inspiring future generations of inventors with his unwavering commitment to innovation and his remarkable contributions to the field. His inventive spirit and passion for pushing boundaries continue to shape the landscape of technology, leaving an indelible mark on the industry.

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