The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Feb. 12, 1999
Tetsuo Ono, Iruma, JP;
Tatsumi Mizutani, Koganei, JP;
Ryouji Hamasaki, Hikari, JP;
Tokuo Kure, Tokyo, JP;
Takafumi Tokunaga, Iruma, JP;
Masayuki Kojima, Kokubunji, JP;
Tetsuo Ono, Iruma, JP;
Tatsumi Mizutani, Koganei, JP;
Ryouji Hamasaki, Hikari, JP;
Tokuo Kure, Tokyo, JP;
Takafumi Tokunaga, Iruma, JP;
Masayuki Kojima, Kokubunji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
According to the present invention, there is provided a sample surface treating apparatus for processing a fine pattern by plasma etching, including a stage provided in a chamber, on which a sample to be subjected to a surface treatment is placed; etching gas supply source for continuously supplying an etching gas for plasma generation into the chamber; a plasma generator for generating a high-density plasma in the chamber; a bias power supply for applying a bias voltage of 100 kHz or higher to the stage independently of the plasma generation; and a pulse modulator for modulating the bias power supply at a frequency of 100 Hz to 10 kHz, wherein a surface treatment in which the minimum feature size is 1 μm or smaller is performed on the sample placed on the stage.