The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
May. 18, 1999
Masanori Kadotani, Kudamatsu, JP;
Saburo Kanai, Hikari, JP;
Youichi Itou, Kudamatsu, JP;
Takashi Fujii, Kudamatsu, JP;
Hironobu Kawahara, Kudamatsu, JP;
Ryouji Hamasaki, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Motohiko Yoshigai, Hikari, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A stage with an electrostatic attracting means is adapted for use in a wafer treatment at a high temperature in a vacuum treatment system. In a vacuum treatment system having a stage provided in a treatment chamber, which electrostatically attracts an object to the stage in a low pressure atmosphere, and treats the object at high temperature by heating the stage, an electrode member of the stage is made of titanium or a titanium alloy and a dielectric film for electrostatic attraction is formed on the electrode member. In order to bond firmly titanium and alumina ceramics, it is desirable to sandwich a nickel alloy (Ni—Al) between the materials.