Ruoh-Haw Chang

Title: Ruoh-Haw Chang: Innovator in Semiconductor Technology

Introduction

Ruoh-Haw Chang is a prominent inventor based in Po-Tzu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Ruoh-Haw Chang's latest patents is the "Multi-conditioner arrangement of a CMP system." This invention provides a multi-conditioner arrangement that enhances the performance of chemical mechanical polishing (CMP) systems. The CMP system includes a polishing table, a polishing pad, and multiple carrier heads that hold semiconductor wafers. The arrangement of conditioners between the carrier heads allows for improved surface texture recovery of the polishing pad, extending its lifetime and reducing wafer-to-wafer differences.

Another notable patent is the "Method for forming silicide." This method involves forming silicide on a semiconductor wafer that includes a doped silicon layer. The process utilizes rapid thermal processing (RTP) steps to create a transitional silicide, followed by the formation of a dielectric layer. This innovative approach enhances the efficiency of semiconductor fabrication.

Career Highlights

Ruoh-Haw Chang has worked with notable companies in the semiconductor industry, including United Microelectronics Corporation and United Semiconductor Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Throughout his career, Ruoh-Haw Chang has collaborated with talented individuals such as Shu-Jen Chen and Hung-Yu Kuo. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Ruoh-Haw Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.