Ruizhe Ren

Title: Ruizhe Ren: Innovator in Semiconductor Technology

Introduction

Ruizhe Ren is a prominent inventor based in Shaanxi, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to material etching processes.

Latest Patents

One of his latest patents is titled "Methods for etching a material layer for semiconductor applications." This patent describes an apparatus and method for etching a material layer using a cyclic etching and deposition process. The method involves several steps, including etching a portion of a material layer on a substrate, forming a protection layer on the sidewalls and bottom surface of the open feature, selectively removing the protection layer from the bottom surface, and continuing to etch the material layer until the desired depth is achieved.

Another notable patent is "Source RF power split inner coil to improve BCD and etch depth performance." This patent includes a radial frequency plasma source with a split type inner coil assembly. The assembly can comprise two intertwining coils or looped coils forming a dome, enhancing the performance of the etching process.

Career Highlights

Ruizhe Ren is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing etching technologies that are crucial for the development of modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Jon Christian Farr and Zhigang Wang, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Ruizhe Ren's innovative work in semiconductor etching processes has established him as a key figure in the industry. His patents reflect a commitment to advancing technology and improving manufacturing techniques in the semiconductor field.